Effect of metallic contamination on interface properties and oxide reliability

Materials Research Society Symposium - Proceedings

Volumn 716, Issue , 2002, Pages 651-656

  Oborina, Elena ^a   Campbell, Scott ^a   Hoff, Andrew M ^a   Gilbert, Richard ^a   Persson, Eric ^a   Simpson, Darrell ^b  

^a University of South Florida   (United States)

^b AGERE SYSTEMS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; CONTAMINATION; DECOMPOSITION; ELECTRIC PROPERTIES; INTERFACES (MATERIALS); METALS; OXIDATION; RELIABILITY; SECONDARY ION MASS SPECTROMETRY; SPIN COATING; STRESSES; THERMAL EFFECTS;

CORONA OXIDE CHARACTERIZATION OF SEMICONDUCTOR METHODS; INTERFACE PROPERTIES; METALLIC CONTAMINATION; OXIDE RELIABILITY; SLAVATED CONTAMINATION IONS;

SILICON WAFERS;

EID: 0036950585     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-716-b13.4     Document Type: Conference Paper

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