Development of spin-on pre metal dielectrics (PMD) for 0.10UM design rule and beyond

Materials Research Society Symposium - Proceedings

Volumn 716, Issue , 2002, Pages 325-330

  Li, Zhongtao ^a   Zhou, Xiaobing ^a   Wyman, Dave ^a   Spaulding, Mike ^a   Kim, Ginam ^a   Grigoras, Stelian ^a   Choi, D K ^a   Moyer, Eric ^a  

^a DOW CORNING CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOROPHOSPHATE GLASS; BOROSILICATE GLASS; ELECTRON ENERGY LOSS SPECTROSCOPY; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION; PHOSPHOLICATE GLASS; SPIN ON PREMETAL DIELECTRICS; THERMAL OXIDE; UNDOPED SILICATE GLASS;

DIELECTRIC MATERIALS;

EID: 0036950517     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-716-b7.10     Document Type: Conference Paper

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