Design for scaled thin film strained-SOI CMOS devices with higher carrier mobility

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 2002, Pages 31-34

  Mizuno, T ^a   Sugiyama, N ^a   Tezuka, T ^a   Numata, T ^a   Maeda, T ^a   Takagi, S ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; HOLE MOBILITY; SEMICONDUCTING SILICON; STRAIN; THIN FILMS;

COULOMB SCATTERING;

CMOS INTEGRATED CIRCUITS;

EID: 0036923550     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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