Ion-enhanced etching of Si(100) with molecular chlorine: Reaction mechanisms and product yields

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 6, 1999, Pages 3340-3350

  Goodman, Rory S ^b   Materer, N ^b   Leone, Stephen R ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033441635     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582063     Document Type: Article

References (39)

1. K. Suzuki and N. Itabashi, Pure Appl. Chem. 68, 1011 (1996).
2. D. L. Flamm, Pure Appl. Chem. 62, 1709 (1990).
3. V. M. Donnelly and D. L. Flamm, Solid State Technol. 24, 161 (1981).
4. R. J. Hamers and Y. J. Wang, Chem. Rev. 96, 1261 (1996).
5. T. Engel, Jpn. J. Appl. Phys., Part 1 35, 2403 (1996).
6. S. R. Leone, Jpn. J. Appl. Phys., Part 1 34, 2073 (1995).
7. H. N. Waltenburg and J. T. Yates, Jr., Chem. Rev. 95, 1589 (1995).
8. T. Rhodin, Prog. Surf. Sci. 50, 131 (1995).
9. H. F. Winters and J. W. Coburn. Surf. Sci. Rep. 14, 161 (1992).
10. M. L. Yu and L. A. DeLouise, Surf. Sci. Rep. 19, 285 (1994).
11. P. C. Zalm, Vacuum 36, 787 (1986).
12. N. Materer, R. S. Goodman, and S. R. Leone, J. Vac. Sci. Technol. A 15, 213 (1997).
13. J. W. Coburn, J. Vac. Sci. Technol. B 12, 1384 (1994).
14. A. W. Kolfschoten, R. A. Haring, A. Haring, and A. E. de Vries, J. Appl. Phys. 55, 3813 (1984).
15. S. C. McNevin and G. E. Becker, J. Vac. Sci. Technol. B 3, 485 (1985).
16. J. van Zwol, J. van Laar, A. W. Kolfschoten, and J. Dieleman, J. Vac. Sci. Technol. B 5, 1410 (1987).
17. R. A. Barker, T. M. Mayer, and W. C. Pearson, J. Vac. Sci. Technol. B 1, 37 (1983).
18. R. A. Rossen and H. H. Sawin, J. Vac. Sci. Technol. A 5, 1595 (1987).
19. J. P. Chang, J. C. Arnold, G. C. H. Zau, H.-S. Shin, and H. H. Sawin. J. Vac. Sci. Technol. A 15, 1853 (1997).
20. J. P. Chang and H. H. Sawin, J. Vac. Sci. Technol. A 15, 610 (1997).
21. M. Balooch, M. Moalem, W.-E. Wang, and A. V. Hamza, J. Vac. Sci. Technol. A 14, 229 (1996).
22. D. J. Oostra, A. Haring, R. P. van Ingen, A. E. de Vries, and G. N. A. van Veen, J. Appl. Phys. 64, 315 (1988).
23. U. Gerlach-Meyer, J. W. Cobum, and E. Kay, Surf. Sci. 103, 177 (1981).
24. D. J. Oostra, R. P. van Ingen, A. Haring, and A. E. de Vries, Appl. Phys. Lett. 50, 1506 (1987).
25. F. H. M. Sanders, A. W. Kolfschoten, J. Dieleman, R. A. Haring, A. Haring, and A. E. de Vries, J. Vac. Sci. Technol. A 2, 487 (1984).
26. U. Gerlach-Meyer, Surf. Sci. 103, 524 (1981).
27. C. Steinbruchei, Appl. Phys. Lett. 55, 1960 (1989).
28. M. E. Barone and D. B. Graves, J. Appl. Phys. 78, 6604 (1995).
29. H. Feil, J. Dieleman, and B. J. Garrison, J. Appl. Phys. 74, 1303 (1993).
30. N. A. Kubota, D. J. Economou, and S. J. Plimpton, J. Appl. Phys. 83, 4055 (1998).
31. D. E. Hanson, A. F. Voter, and J. D. Kress, J. Appl. Phys. 82, 3552 (1997).
32. M. Menzinger and L. Wahlin, Rev. Sci. Instrum. 40, 102 (1969).
33. W. C. Wiley and I. H. McLaren, Rev. Sci. Instrum. 26, 1150 (1955).
34. A. Benninghoven, Surf. Sci. 53, 596 (1975).
35. S. G. Lias, J. E. Bartmess, J. F. Liebman, J. L. Holmes, R. D. Levin, and W. G. Mallard, J. Phys. Chem. Ref. Data. Suppl. 17, 1 (1988).
36. E. R. Fisher and P. B. Armentrout, J. Phys. Chem. 95, 4765 (1991).
37. H. Doshita, K. Ohtani, and A. Namiki, J. Vac. Sci. Technol. A 16, 265 (1998).
38. J. L. Souchière and V. T. Binh, Surf. Sci. 168, 52 (1986).
39. W. O. Hofer, in Sputtering by Particle Bombardment III, edited by R. Behrisch and K. Wittmaack (Springer, New York, 1991), Vol. 64, p. 15.