Integrated AIN/diamond heat spreaders for silicon device processing

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 6, 2002, Pages 1974-1982

  Yoganand, S N ^a   Jagannadham, Kasichainula ^a   Karoui, A ^a   Wang, H ^b  

^a North Carolina State University   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM NITRIDE; CHEMICAL VAPOR DEPOSITION; DEPOSITION; FILM GROWTH; MAGNETRON SPUTTERING; MORPHOLOGY; SECONDARY ION MASS SPECTROMETRY; SILICON WAFERS; SPREADERS; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

HEAT SPREADERS;

DIAMOND FILMS;

EID: 0036863138     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1513643     Document Type: Article

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