The electrical conduction mechanism for the polycrystalline diamond membrane in the voltage range of ± 50 V

Materials Letters

Volumn 56, Issue 5, 2002, Pages 867-872

  Huang, Bohr Ran ^a   Chang, Shoou Jinn ^b  

^a NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Frenkel Poole; Generation current; Polycrystalline diamond membrane; Schottky emission

Indexed keywords

DIAMOND FILMS; ELECTRIC CONDUCTANCE; ELECTRIC POTENTIAL; ETCHING; GRAIN BOUNDARIES; MICROWAVES; MIXTURES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCHOTTKY BARRIER DIODES; SILICON WAFERS; SUBSTRATES;

POLYCRYSTALLINE DIAMOND MEMBRANES;

POLYCRYSTALLINE MATERIALS;

EID: 0036827557     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(02)00629-8     Document Type: Article

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