Stoichiometry of the diamond/silicon interface and its influence on the silicon content of diamond films

Journal of Applied Physics

Volumn 83, Issue 2, 1998, Pages 1120-1124

  Sharda, T ^a   Vaidya, A ^a   Misra, D S ^a   Bhargava, S ^b   Bist, H D ^b   Veluchamy, P ^c   Minoura, H ^c   Selvam, P ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^c GIFU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000146324     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366803     Document Type: Article

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