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Volumn 38, Issue 10, 1999, Pages 6039-6046

Electrical conduction mechanism of Al contacts and undoped polycrystalline diamond films

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC SPACE CHARGE; EQUIVALENT CIRCUITS; GRAIN BOUNDARIES; HIGH TEMPERATURE OPERATIONS; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SCHOTTKY BARRIER DIODES;

EID: 0033321808     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.6039     Document Type: Article
Times cited : (4)

References (39)
  • 9
    • 0039383754 scopus 로고    scopus 로고
    • B. R. Huang, K. Y. Yang, T. J. Ho and C. H. Wu: Proc. 1st Asia-Pacific Int. Symp. Basic Application of Plasma Technology, Taiwan, Yunlin (1997) p. 199.
    • (1997) Proc. , vol.1 , pp. 199
    • Huang, B.R.1    Yang, K.Y.2    Ho, T.J.3    Wu, C.H.4
  • 13
    • 33645040442 scopus 로고
    • Dr. Thesis, Electrical Engineering, Michigan State University
    • B. R. Huang: Dr. Thesis, Electrical Engineering, Michigan State University, 1992.
    • (1992)
    • Huang, B.R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.