Effect of Fe doping of thin (Ba,Sr)TiO3 films on increase in dielectric constant

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 10, 2002, Pages 6060-6064

  Imai, Ketaro ^a   Takeno, Shiro ^a   Nakamura, Kenro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

(Ba,Si)TiO3; BST; Capacitor; Dielectric constant; Doping; DRAM; EDX; Fe; SrTiO3

Indexed keywords

BARIUM COMPOUNDS; CAPACITORS; DOPING (ADDITIVES); DYNAMIC RANDOM ACCESS STORAGE; ELECTRONS; ENERGY DISPERSIVE SPECTROSCOPY; IRON; PERMITTIVITY;

BARIUM STRONTIUM TITANATE; ELECTRON STANDING WAVE METHOD;

THIN FILMS;

EID: 0036819063     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.6060     Document Type: Article

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