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Volumn 187, Issue 2, 2002, Pages 178-188

Density effects in sputtering at normal and oblique ion bombardment

Author keywords

Angular and energy distributions; Computer simulation; Density effects; Sputtering; Sputtering yield

Indexed keywords

COMPUTER SIMULATION; DENSITY (SPECIFIC GRAVITY); SEMICONDUCTING GERMANIUM; SPUTTERING; SURFACE PHENOMENA; TARGETS;

EID: 0036467184     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(01)00932-6     Document Type: Article
Times cited : (7)

References (50)
  • 3
    • 84915484666 scopus 로고
    • Rendiconti della Scuola Internazionale di Fisica "Enrico Fermi"
    • (1960) Corso XIII , vol.13 , pp. 158
    • Pease, R.S.1
  • 43
    • 0003127705 scopus 로고
    • R. Behrisch, K. Wittmaack (Eds.), Sputtering by Particle Bombardment III, Springer, Berlin
    • (1991) Top. Appl. Phys. , vol.64 , pp. 15
    • Hofer, W.O.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.