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Surface and Coatings Technology

Volumn 160, Issue 1, 2002, Pages 14-19

Lower filament temperature limit of diamond growth in a hot-filament CVD system

(2) Zhang, G F a Buck, V a

a UNIVERSITY OF DUISBURG ESSEN (Germany)

Author keywords

Diamond films; Filament temperature; Hot filament chemical vapor deposition (HFCVD)

Indexed keywords

RAMAN SPECTROSCOPY; SYNTHESIS (CHEMICAL); VAPOR DEPOSITION; X RAY DIFFRACTION;

FILAMENT TEMPERATURE;

DIAMOND FILMS;

CHEMICAL VAPOR DEPOSITION; DIAMOND; FILM; TEMPERATURE EFFECT;

EID: 0036789650 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(02)00327-4 Document Type: Article

Times cited : (14)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.