Diluent gas effect on diamond CVD growth

Thin Solid Films

Volumn 345, Issue 1, 1999, Pages 55-59

  Mitsuda, Yoshitaka ^a   Kobayashi, Kenji ^a  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; FILM GROWTH; HYDROCARBONS; HYDROGEN; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

DIAMOND GROWTH; DILUENT GAS EFFECT;

DIAMOND FILMS;

EID: 0033531823     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00105-4     Document Type: Article

References (6)

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2. Saito Y., Sato K., Gomi K., Miyadera H. J. Mater. Sci. 25:1990;1246.
3. Spitsyn B.V., Bouilov L.L., Derjaguin B.V. J. Cryst. Growth. 52:1981;219.
4. Mucha J.A., Flamm D.L., Ibbotson D.E. J. Appl. Phys. 65:1989;3448.
5. Sobue K., Mitsuda Y., Masuko N., Imai H. Hyomen Gijyutsu (in Japanese). 45:1994;1126.
6. Mitsuda Y., Yashiro M. Appl. Phys. Lett. 1999;. to be submitted.