Improvement of Ta filament for diamond CVD

Thin Solid Films

Volumn 317, Issue 1-2, 1998, Pages 371-375

  Tsutsumoto, Takahiro ^a  

^a Western Hiroshima Prefecture Industrial Research Institute   (Japan)

Author keywords

Carburization; Diamond CVD; Ta filament

Indexed keywords

BENDING STRENGTH; CARBURIZING; CHEMICAL VAPOR DEPOSITION; DIAMONDS; ELECTRIC RESISTANCE; EMBRITTLEMENT; MECHANICAL TESTING; SCANNING ELECTRON MICROSCOPY; TANTALUM; TANTALUM CARBIDE;

DIAMOND CHEMICAL VAPOR DEPOSITION; TANTALUM FILAMENT;

WIRE;

EID: 0032051001     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00626-3     Document Type: Article

References (5)

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2. H. Matsubara, T. Sakuma, J. Mater. Sci. 25 (1990) 4472.
3. S. Okoli, R. Haubner, B. Lux, Surf. Coatings Technol. 47 (1991) 585.
4. D. Satrapa, R. Haubner, B. Lux, in: M. Yoshikawa et al. (Eds.), Proc. of 2nd Int. Conf. on Application of Diamond Film and Related Mater., MYU, Tokyo, 1993, p. 501.
5. T. Tsutsumoto, in: M. Yoshikawa et al. (Eds.), Proc. of 2nd Int. Conf. on Application of Diamond Film and Related Mater., MYU, Tokyo, 1993, p. 521.