Role of xenon additive in microwave plasma-assisted (H2+CH4) chemical vapor deposition of diamond thin film

Journal of Applied Physics

Volumn 84, Issue 11, 1998, Pages 6059-6063

  Hosomi, Takeshi ^a   Maki, Tetsuro ^a   Kobayashi, Takeshi ^a   Yoshizako, Yuji ^b   Taniguchi, Michio ^b   Sugiyo, Masato ^b  

^a OSAKA UNIVERSITY   (Japan)

^b DAIHEN Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343628271     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368916     Document Type: Article

References (13)

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