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Volumn 50, Issue 10, 2002, Pages 2057-2083
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A phase field model for failure in interconnect lines due to coupled diffusion mechanisms
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Author keywords
A. Diffusion; A. Electromigration; B. Voids; C. Finite elements
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Indexed keywords
ASYMPTOTIC STABILITY;
COMPUTER SIMULATION;
CONVERGENCE OF NUMERICAL METHODS;
DIFFUSION;
ELECTROMIGRATION;
FINITE ELEMENT METHOD;
GEOMETRY;
INTERFACES (MATERIALS);
MATHEMATICAL MODELS;
MICROSTRUCTURE;
STRESS ANALYSIS;
DIFFUSE INTERFACES;
MICROELECTRONIC PROCESSING;
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EID: 0036778668
PISSN: 00225096
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-5096(02)00019-4 Document Type: Article |
Times cited : (66)
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References (28)
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