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Volumn 50, Issue 10, 2002, Pages 2057-2083

A phase field model for failure in interconnect lines due to coupled diffusion mechanisms

Author keywords

A. Diffusion; A. Electromigration; B. Voids; C. Finite elements

Indexed keywords

ASYMPTOTIC STABILITY; COMPUTER SIMULATION; CONVERGENCE OF NUMERICAL METHODS; DIFFUSION; ELECTROMIGRATION; FINITE ELEMENT METHOD; GEOMETRY; INTERFACES (MATERIALS); MATHEMATICAL MODELS; MICROSTRUCTURE; STRESS ANALYSIS;

EID: 0036778668     PISSN: 00225096     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-5096(02)00019-4     Document Type: Article
Times cited : (66)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.