In situ chamber cleaning using atomic H in catalytic-CVD apparatus for mass production of a-Si:H solar cells

Solar Energy Materials and Solar Cells

Volumn 74, Issue 1-4, 2002, Pages 373-377

  Masuda, Atsushi ^a   Ishibashi, Yoriko ^a   Uchida, Kenji ^a   Kamesaki, Koji ^a   Izumi, Akira ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Atomic hydrogen; Catalytic chemical vapor deposition; Chamber cleaning; Hot wire chemical vapor deposition; Hydrogenated amorphous silicon; Mass production apparatus; Solar cells

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; HYDROGEN; HYDROGENATION;

CATALYZERS;

SILICON SOLAR CELLS;

EID: 0036778628     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(02)00130-7     Document Type: Article

References (7)