Texture etched ZnO:Al films as front contact and back reflector in amorphous silicon p-i-n and n-i-p solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 1997, Pages 619-622

  Rech, B ^a   Wieder, S ^a   Beneking, C ^a   Loeffl, A ^a   Kluth, O ^a   Reetz, W ^a   Wagner, H ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CURRENT DENSITY; ETCHING; MIRRORS; SHORT CIRCUIT CURRENTS; TEXTURES; THIN FILM DEVICES; ZINC OXIDE;

OPEN CIRCUIT VOLTAGES;

SILICON SOLAR CELLS;

EID: 0031361236     PISSN: 01608371     EISSN: None     Source Type: None    
DOI: 10.1109/PVSC.1997.654165     Document Type: Conference Paper

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