SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 64, Issue 1-4, 2002, Pages 417-428

Modelling roughness, grain and confinement effects on transport in embedded metallic films

(2) Knight, Gary D a Smy, Tom a

a CARLETON UNIVERSITY (Canada)

Author keywords

Conductivity tensor; Mesoscale metallization; Nanowire resistivity; Pseudo Monte Carlo; QSE; Transport size effects

Indexed keywords

COMPUTER SIMULATION; ELECTRIC CONDUCTIVITY; ELECTRIC WIRE; ELECTRODEPOSITION; ELECTRON TRANSPORT PROPERTIES; GRAIN SIZE AND SHAPE; METALLIZING; MONTE CARLO METHODS; NANOSTRUCTURED MATERIALS; PARTICLE OPTICS; SURFACE ROUGHNESS; TENSORS; ULSI CIRCUITS;

EMBEDDED DAMASCENE STRUCTURES;

METALLIC FILMS;

EID: 0036776501 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-9317(02)00816-X Document Type: Article

Times cited : (5)

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