Study of transmittance of polymers and influence of photoacid generator on resist transmittance at extreme ultraviolet wavelength

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 9, 2002, Pages 5864-5867

  Irie, Shigeo ^a   Endo, Masayuki ^a   Sasago, Masaru ^a   Kandaka, Noriaki ^b   Kondo, Hiroyuki ^a   Murakami, Katsuhiko ^b  

^a PANASONIC CORPORATION   (Japan)

^b NIKON CORPORATION   (Japan)

Author keywords

Absorption; EUV lithography; EUV reflectometer; Laser plasma X ray source; Photoacid generator; Polymer; Resist; Transmittance

Indexed keywords

ELECTRIC GENERATORS; LIGHT TRANSMISSION; POLYMERS; SILICON; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

LITHOGRAPHY;

EID: 0036757853     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.5864     Document Type: Article

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