Aberration evaluation and tolerancing of 193nm lithographic objective lenses

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 269-280

  Smith, Bruce W ^a   Webb, James E ^b   Petersen, John S ^c   Meute, Jeff ^c  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

^b Tropel Corporation ^*  (United States)

^c SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; OPTICAL INSTRUMENTS;

193 NM RESIST; AERIAL IMAGING; FEATURE SIZES; FEATURE TYPES; IMAGE THRESHOLD; LENS PERFORMANCE; OBJECTIVE LENSES; PARTIAL-COHERENCE; STREHL RATIOS; ZERNIKE POLYNOMIALS;

LENSES;

EID: 0010650203     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310756     Document Type: Conference Paper

References (10)

1. Lord Rayleigh, Scientific Papers Vol. 1, Dover, New York, 1964, p. 432.
2. B.W. Smith, Microlithography: Science and Technology, Chapter 3: Optics for Photolithography, J.R. Sheats, B.W. Smith ed., New York: Marcel Dekker, 1998.
3. A. Hill, J. Webb., A. Phillips, J. Connors, SPIE Vol. 1927, (1993), 608.
4. L.A. Jones, J. Franklin Inst., 190, 39 (1920).
5. Prolith/2 version 5.
6. Prolith/2 parameter files courtesy of J. Byers, SEMATECH.
7. C. Sparkes, L. Thompson, R. Travers, Proc. SPIE Vol. 2726, 690 (1996).
8. J. Bruning, OSA Symposium on Design, Fabrication, and Testing for sub-0.25 micron Lithographic Imaging: Not published (1996).
9. B.W. Smith, L. Zavyalova, J. Petersen, Illumination pupil filtering using modified quadrupole apertures, Proc. SPIE Vol. 3334 (1998).
10. B.W. Smith, Revalidation of the Rayleigh resolution and DOF limits, Proc. SPIE Vol. 3334 (1998).