Formation of cubic boron nitride films by r.f. magnetron sputtering

Surface and Interface Analysis

Volumn 34, Issue 1, 2002, Pages 732-734

  Jiang, Liudi ^c   Fitzgerald, A G ^a   Rose, M J ^a   Lousa, A ^b   Gimeno, S ^b  

^a UNIVERSITY OF DUNDEE   (United Kingdom)

^b UNIVERSITY OF BARCELONA   (Spain)

^c UNIVERSITY OF EDINBURGH   (United Kingdom)

Author keywords

Cubic boron nitride; FTIR; Magnetron sputtering; XPS

Indexed keywords

CHARACTERIZATION; COMPOSITION EFFECTS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; RESIDUAL STRESSES; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

BIAS VOLTAGE; RADIOFREQUENCY MAGNETRON SPUTTERING;

CUBIC BORON NITRIDE;

EID: 0036693490     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1399     Document Type: Conference Paper

References (17)