High-resolution imaging ellipsometer

Applied Optics

Volumn 41, Issue 22, 2002, Pages 4443-4450

  Zhan, Qiwen ^a   Leger, James R ^a  

^a University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; ELLIPSOMETRY; GEOMETRICAL OPTICS; OPTICAL FILTERS; OPTICAL INSTRUMENT LENSES; OPTICAL RESOLVING POWER; POLYMETHYL METHACRYLATES; REFRACTIVE INDEX; SENSITIVITY ANALYSIS;

IMAGING ELLIPSOMETERS;

IMAGING TECHNIQUES;

EID: 0036685327     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.41.004443     Document Type: Article

References (11)

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9. E. Wolf, “Electromagnetic diffraction in optical systems. I. An integral representation of the image field,” Proc. R. Soc. London Ser. A 253, 349-357 (1959).
10. B. Richards and E. Wolf, “Electromagnetic diffraction in optical systems II. Structure of the image field in an aplanatic system,” Proc. R. Soc. London Ser. A 253, 358-379 (1959).
11. J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, “Characterization of titanium nitride (TiN) films on various substrates using spectrophotometry, beam profile reflectom-etry, beam profile ellipsometry and spectroscopic beam profile ellipsometry,” Thin Solid Films 313-314, 308-313 (1998).