Electron field emission characteristics of electrochemical etched Si tip array

Solid State Communications

Volumn 123, Issue 5, 2002, Pages 205-207

  Ng, K L ^a   Yuan, J ^a   Cheung, J T ^b   Cheah, K W ^a  

^a HONG KONG BAPTIST UNIVERSITY   (Hong Kong)

^b ROCKWELL SCIENTIFIC COMPANY   (United States)

Author keywords

A. si tip array; E. electron field emission

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ETCHING; MICROELECTRONICS; PHOTOLITHOGRAPHY;

ELECTROCHEMICAL ETCHING; ELECTRON FIELD EMISSIONS;

SEMICONDUCTING SILICON;

EID: 0036682801     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1098(02)00287-9     Document Type: Article

References (27)