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Volumn 157, Issue 1, 2002, Pages 47-54

Influence of target power density and substrate bias voltage on the electrochemical properties of type 304 SS films prepared by unbalanced magnetron sputtering

(4) Yoo, Ji Hong a Ahn, Seung Ho a Kim, Jung Gu a Lee, Sang Yul b

a Sungkyunkwan University (South Korea)

b Hankuk Aviation University (South Korea)

Author keywords

Electrochemical impedance spectroscopy (EIS); Electrochemical polarization measurement; Porosity; Stainless steel coating; Unbalanced magnetron sputtering

Indexed keywords

CARBON STEEL; COATINGS; CORROSION PROTECTION; ELECTROCHEMISTRY; MAGNETRON SPUTTERING; METALLIC FILMS; MORPHOLOGY; POROSITY; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; SUBSTRATES; TARGETS; X RAY DIFFRACTION ANALYSIS;

UNBALANCED MAGNETRON SPUTTERING (UBMS);

STAINLESS STEEL;

COATING; ELECTROCHEMICAL ANALYSIS; POROSITY; PROTECTION; SPUTTERING; STAINLESS STEEL;

EID: 0036682425 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(02)00132-9 Document Type: Article

Times cited : (17)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.