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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 4, 2002, Pages 1320-1326

Characterization of TiAlN thin film annealed under O2 by in situ time of flight direct recoil spectroscopy/mass spectroscopy of recoiled ions and ex situ x-ray photoelectron spectroscopy

(3) Tempez, A a Bensaoula, A a Schultz, A b

a UNIVERSITY OF HOUSTON (United States)

b Ionwerks (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; COMPOSITION; MASS SPECTROMETRY; OXIDATION; OXYGEN; PRESSURE EFFECTS; SURFACE PROPERTIES; THERMAL EFFECTS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

FLIGHT DIRECT RECOIL SPECTROSCOPY; RECOILED IONS; TITANIUM ALUMINUM NITRIDE;

TITANIUM COMPOUNDS;

EID: 0036649068 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1482711 Document Type: Article

Times cited : (14)

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