Studies of ferroelectric film growth and capacitor interface processes via in situ analytical techniques and correlation with electrical properties

Integrated Ferroelectrics

Volumn 32, Issue 1-4, 2001, Pages 121-131

  Krauss, A R ^a   Auciello, O ^a   Dhote, A M ^a   Im, J ^a   Aggarwal, S ^a   Ramesh, R ^a   Irene, E A ^a   Gao, Y ^a   Mueller, A H ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

BST films; Film stoichiometry; Leakage; Loss; Magnetron sputter deposition; Phase shifters; Tunability

Indexed keywords

COMPOSITION EFFECTS; CRYSTAL MICROSTRUCTURE; ELECTRIC PROPERTIES; ELLIPSOMETRY; FILM GROWTH; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; THIN FILM DEVICES; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CAPACITOR INTERFACE; RECOIL SPECTROSCOPY; TIME OF FLIGHT ION SCATTERING;

FERROELECTRIC THIN FILMS;

EID: 0035035962     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584580108215683     Document Type: Conference Paper

References (9)