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Volumn 17, Issue 7, 2002, Pages 1855-1862
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Thermal expansion of low-pressure chemical vapor deposition polysilicon films
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CHEMICAL VAPOR DEPOSITION;
RESIDUAL STRESSES;
SINGLE CRYSTALS;
SUBSTRATES;
TENSILE STRESS;
THERMAL EXPANSION;
LOW-PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);
POLYSILICON;
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EID: 0036648809
PISSN: 08842914
EISSN: None
Source Type: Journal
DOI: 10.1557/JMR.2002.0274 Document Type: Article |
Times cited : (17)
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References (14)
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