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Volumn 17, Issue 7, 2002, Pages 1855-1862

Thermal expansion of low-pressure chemical vapor deposition polysilicon films

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; RESIDUAL STRESSES; SINGLE CRYSTALS; SUBSTRATES; TENSILE STRESS; THERMAL EXPANSION;

EID: 0036648809     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2002.0274     Document Type: Article
Times cited : (17)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.