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Thin Solid Films

Volumn 414, Issue 1, 2002, Pages 56-62

Leakage current distribution in ultrathin oxide on silicon surface with step/terrace structures

(4) Murata, M a Tokuda, N a Hojo, D a Yamabe, K a

a UNIVERSITY OF TSUKUBA (Japan)

Author keywords

Annealing; Leakage current; Microroughness; Oxidation; Oxide; Reliability; Topography

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; LEAKAGE CURRENTS; OXIDATION; SILICA; SURFACE ROUGHNESS;

ULTRATHIN OXIDES;

ULTRATHIN FILMS;

EID: 0036647995 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00432-7 Document Type: Article

Times cited : (7)

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