On the dependence of plasma-induced charging damage on antenna area

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1999, Pages 21-24

  Hwang, G S ^a   Giapis, K P ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNAS; COMPUTER SIMULATION; CURRENT DENSITY; DIRECTIONAL PATTERNS (ANTENNA); ELECTRON TUNNELING; GATES (TRANSISTOR); PLASMA INTERACTIONS;

ANTENNA AREA; GATE OXIDE; PLASMA INDUCED CHARGING DAMAGE;

PLASMA ETCHING;

EID: 0033327855     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (12)