Investigation of phase shift mask distortion effect

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 265-270

  Du, Jinglei ^a,c   Cui, Zheng ^b   Yuan, XiaoCong ^c   Guo, Yongkang ^a  

^a SICHUAN UNIVERSITY   (China)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Optical lithography simulation; Optical proximity effect; Phase shift mask

Indexed keywords

COMPUTER SIMULATION; IMAGING TECHNIQUES; INTEGRATED CIRCUIT MANUFACTURE; LASER APPLICATIONS; PHASE SHIFT; PHOTOLITHOGRAPHY;

LASER SCANNING LITHOGRAPHY; MASK DISTORTION EFFECTS;

MASKS;

EID: 0036643637     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00569-5     Document Type: Article

References (6)

1. Simulation of optical lithography from distorted photomasks
2. Precompensation approach to improving the quality of laser direct writing patterns by a modified proximity function
3. Optical proximity correction in laser direct writing
4. Du Invesitigation of OPC mask distortion effect