Precompensation approach for improving the quality of laser direct writing patterns by a modified proximity function

Optical Engineering

Volumn 39, Issue 3, 2000, Pages 771-775

  Du, Jinglei ^a   Gao, Fuhua ^a   Guo, Yongkang ^a   Du, Chunlei ^b   Qiu, Chuankai ^b   Cui, Zheng ^c  

^a SICHUAN UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^c RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ENERGY ABSORPTION; LASER BEAM EFFECTS; MASKS; MATHEMATICAL MODELS; PHOTORESISTS; PROJECTION SYSTEMS;

LASER DIRECT WRITING; MODIFIED PROXIMITY FUNCTION; OPTICAL PROXIMITY CORRECTION;

PHOTOLITHOGRAPHY;

EID: 0033751869     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.602426     Document Type: Article

References (7)

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