Simulation of optical lithography from distorted photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1492-1499

  Cui, Zheng ^a   Du, Jinglei ^b   Zheng, Yangsu ^b   Guo, Yongkang ^b  

^a RUTHERFORD APPLETON LABORATORY   (United Kingdom)

^b SICHUAN UNIVERSITY   (China)

Author keywords

Mask distortion; Optical lithography; Optical proximity effect; Photomask

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; FEATURE EXTRACTION; IMAGE ANALYSIS; MASKS;

DISTORTED PHOTOMASKS;

PHOTORESISTS;

EID: 0035758465     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435689     Document Type: Article

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