SCOPUS 정보 검색 플랫폼

Volumn 4404, Issue , 2001, Pages 347-353

Investigation of OPC mask distortion effect

Author keywords

Optical proximity correction; Photolithography simulation; Photomask distortion

Indexed keywords

COMPUTER SIMULATION; FEATURE EXTRACTION; IMAGE ANALYSIS; LASER BEAM EFFECTS; PHOTOLITHOGRAPHY; SCANNING; VLSI CIRCUITS;

OPTICAL PROXIMITY CORRECTION (OPC); PHOTOMASK DISTORTIONS;

MASKS;

EID: 0034839564 PISSN: 0277786X EISSN: None Source Type: Journal
DOI: 10.1117/12.425225 Document Type: Article

Times cited : (4)

References (9)

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2
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- Mathematical and CAD framework for proximity correction
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- Cobb, N.¹ Zakhor, A.²

3
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- (1999) SPIE , vol.3676 , pp. 494
- Cui, Z.¹

4
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- Optical proximity correction in laser direct writing
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- Du, J.¹ Huang, Q.² Yao, J.³ Guo, Y.⁴ Qiu, C.⁵ Cui, Z.⁶

5
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- Computer simulation of optical lithography
- Chengdu
- (1994) Proc. Symp. Optical Application Technologies
- Cui, Z.¹

6
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- Precompensation approach to improving the quality of laser direct writing patterns by a modified proximity function
- (2000) Optical Engineering , vol.39 , Issue.3 , pp. 771
- Du, J.¹ Gao, F.² Guo, Y.³ Du, C.⁴ Qiu, C.⁵ Cui, Z.⁶

9
- 0035758465
- Simulation of optical lithography from distorted photomasks
- to be published
- (2001) SPIE , vol.4346
- Cui, Z.¹ Du, J.² Zheng, Y.³ Guo, Y.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.