A new family of non-chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 349-358

  Aviram, Ari ^a   Angelopoulos, Marie ^a   Babich, Edward ^a   Babich, Inna ^a   Petrillo, Karen ^a   Seeger, David ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERS; ELECTRON BEAMS; ESTERS; OPTICAL RESOLVING POWER; ULTRAVIOLET RADIATION; X RAYS;

RESISTS;

LITHOGRAPHY;

EID: 0032403561     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309589     Document Type: Conference Paper

References (3)