Preparation of a TiO2 film coated Si device for photo-decomposition of water by CVD method using Ti(OPri)4

Materials Transactions

Volumn 43, Issue 7, 2002, Pages 1533-1536

  Sato, Nobuaki ^a   Nakajima, Kazuo ^a   Usami, Noritaka ^a   Takahashi, Hideyuki ^a   Muramatsu, Atsushi ^a   Matsubara, Eiichiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Photo decomposition of water; Photocatalysis; Silicon solar cell; TiO2 thin film; TiO2 Si heterostructure device; Titanium tetra i propoxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATED MATERIALS; DECOMPOSITION; FILM GROWTH; HETEROJUNCTIONS; PHOTOCATALYSIS; SURFACE ROUGHNESS; THIN FILMS; TITANIUM DIOXIDE; WATER;

PHOTODECOMPOSITION;

SILICON WAFERS;

EID: 0036630291     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.43.1533     Document Type: Conference Paper

References (8)