Preparation of titanium dioxide thin films by means of a hot wall technique

Applied Surface Science

Volumn 142, Issue 1, 1999, Pages 182-187

  Nakamura, Takato ^a   Asai, Hiroshige ^a   Akiyama, Mikiya ^a   Azuma, Naoto ^a   Takahashi, Naoyuki ^a   Ishino, Kenei ^a   Fujiyasu, Hiroshi ^a   Yoshioka, Masayuki ^b  

^a SHIZUOKA UNIVERSITY   (Japan)

^b Shizuoka Industrial Research Institute of Shizuoka Prefecture   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRIC PROPERTIES; FILM GROWTH; MINERALS; PLASTIC FILMS; SILICON; STOICHIOMETRY; SUBSTRATES; THERMAL EFFECTS; TITANIUM COMPOUNDS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

ANATASE; CAPACITANCE VOLTAGE CHARACTERISTICS; HOT WALL TECHNIQUE; POLYCRYSTALLINE OXIDE FILMS; TITANIUM ISOPROPOXIDE;

THIN FILMS;

EID: 0032687233     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00709-0     Document Type: Article

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