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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 A, 2002, Pages 3955-3960

Calculation of the precursor flux from optical emission spectroscopy data in plasma enhanced chemical vapour deposition of silane and its correlation with the deposition rate

(3) Ray, Partha Pratim a Gupta, Namita Dutta a Chaudhuri, Partha a

a DEPARTMENT OF MATERIALS SCIENCE (India)

Author keywords

Amorphous silicon; Microcrystalline silicon; Optical emission spectroscopy; Silane argon plasma

Indexed keywords

AMORPHOUS SILICON; MIXTURES; NUMERICAL METHODS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTION KINETICS; SPECTROSCOPY;

DEPOSITION RATE; MICROCRYSTALLINE SILICON; OPTICAL EMISSION SPECTROSCOPY;

SILANES;

EID: 0036614874 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.3955 Document Type: Article

Times cited : (6)

References (36)

1
- 0347387997
- (1986) J. Appl. Phys. , vol.59 , pp. 3402
- Robertson, R.¹ Gallagher, A.²

2
- 0344751778
- (1983) J. Non-Cryst. Solids , vol.59-60 , pp. 767
- Matsuda, A.¹

3
- 0001435806
- (1990) J. Appl. Phys. , vol.67 , pp. 6220
- Doughty, D.A.¹ Doyle, J.R.² Lin, G.H.³ Gallaghar, A.⁴

4
- 0000182211
- (2000) J. Appl. Phys. , vol.87 , pp. 2608
- Robertson, J.¹

5
- 0019539453
- (1981) J. Appl. Phys. , vol.52 , pp. 1285
- Kampas, F.J.¹ Giffith, R.W.²

6
- 0002050867
- (1990) Plasma Chem. Plasma Process , vol.10 , pp. 3
- Veprek, S.¹ Heintze, M.²

7
- 0039945184
- (1990) Appl. Phys. Lett. , vol.56 , pp. 1766
- Veprek, S.¹ Veprek-Heijman, M.G.J.²

8
- 0033893372
- (2000) J. Phys. D , vol.33 , pp. 381
- Hertl, M.¹ Jolly, J.²

9
- 0024054593
- (1989) Jpn. J. Appl. Phys. , vol.27
- Itabashi, N.¹ Kato, K.² Nishiwaki, N.³ Goto, T.⁴ Yamada, C.⁵ Hirota, E.⁶

10
- 0024606146
- (1989) Jpn. J. Appl. Phys. , vol.28
- Itabashi, N.¹ Kato, K.² Nishiwaki, N.³ Goto, T.⁴ Yamada, C.⁵ Hirota, E.⁶

11
- 0025402112
- (1990) Jpn. J. Appl. Phys. , vol.29
- Itabashi, N.¹ Nishiwaki, N.² Magane, M.³ Naito, S.⁴ Goto, T.⁵ Matsuda, A.⁶ Yamada, C.⁷ Hirota, E.⁸

12
- 0035874163
- (2001) Thin Solid Films , vol.386 , pp. 256
- Fukuda, Y.¹ Sakuma, Y.² Fukai, C.³ Fujimura, Y.⁴ Azuma, K.⁵ Shirai, H.⁶

13
- 0000565722
- (1998) Chem. Phys. Lett. , vol.298 , pp. 211
- Das, U.K.¹ Chaudhuri, P.²

14
- 0010209394
- eds. G. Bruno, P. Capezzuto and A. Madan (Academic Press, San Diego); Chap. 5
- (1995) Plasma Deposition of Amorphous Silicon Based Materials , pp. 245
- Madan, A.¹

15
- 0020163805
- (1982) Philos. Mag. B , vol.46 , pp. 1
- Mishima, Y.¹ Miyazaki, S.² Hirose, M.³ Osaka, Y.⁴

16
- 0001038540
- (1993) Plasma Sources Sci. Technol. , vol.2 , pp. 127
- Guimaraes, F.¹ Bretagne, J.²

17
- 0000107399
- (1998) Phys. Rev. A , vol.57 , pp. 267
- Chilton, J.E.¹ Boffard, J.B.² Schappe, R.S.³ Lin, C.C.⁴

18
- 4043105192
- (1988) J. Appl. Phys. , vol.63 , pp. 2532
- Kushner, M.J.¹

19
- 0001438811
- (1992) Phys. Rev. A , vol.45 , pp. 2520
- Makabe, T.¹ Nakano, N.² Yamaguchi, Y.³

20
- 0025483516
- (1990) J. Phys. D , vol.23 , pp. 1184
- Tochikubo, F.¹ Kokubo, T.² Kakuta, S.³ Suzuki, A.⁴ Makabe, T.⁵

21
- 0002301087
- (1994) Plasma Sources Sci. Technol. , vol.3 , pp. 72
- Layeillon, L.¹ Dollet, A.² Couderc, J.P.³ Despax, B.⁴

22
- 0010173769
- ed. Y. Gerasimov (Mir, Moscow); Chap. 1
- (1985) Physical Chemistry , vol.2 , pp. 51

23
- 0027574586
- (1993) Jpn. J. Appl. Phys. , vol.32
- Kono, A.¹ Koike, N.² Okuda, K.³ Goto, T.⁴

24
- 0020824148
- (1983) J. Appl. Phys. , vol.54 , pp. 4916
- Mosburg E.R., Jr.¹ Kerns, R.C.² Abelson, J.R.³

25
- 84956119865
- (1990) Jpn. J. Appl. Phys. , vol.29 , pp. 1889
- Oda, S.¹ Noda, J.² Matsumura, M.³

26
- 0029354653
- (1995) Jpn. J. Appl. Phys. , vol.34 , pp. 4239
- Shirafuji, T.¹ Tachibana, K.² Matsui, Y.³

27
- 0003945437
- eds. G. Bruno, P. Capezzuto and A. Madan (Academic Press, San Diego); Chap. 1
- (1995) Plasma Deposition of Amorphous Silicon Based Materials , pp. 38
- Bruno, G.¹ Capezzuto, P.² Cicala, G.³

28
- 0024781441
- (1989) J. Non-Cryst. Solids , vol.114 , pp. 151
- Tsai, C.C.¹ Anderson, G.B.² Thomson, R.³ Wacker, B.⁴

29
- 0000865659
- (1981) Chimia , vol.34 , pp. 489
- Veprek, S.¹

30
- 36149037913
- (1981) J. Phys. C , vol.14 , pp. 295
- Veprek, S.¹ Iqbal, Z.² Oswald, H.R.³ Webb, A.P.⁴

31
- 0025477149
- (1990) Jpn. J. Appl. Phys. , vol.29
- Nomoto, K.¹ Urano, Y.² Guizot, J.-L.³ Ganguly, G.⁴ Matsuda, A.⁵

32
- 0000879795
- (1990) Mater. Res. Soc. Symp. Proc. , vol.164 , pp. 195
- Shimizu, I.¹ Hanna, J.L.² Shirai, H.³

33
- 0000755434
- (1991) J. Non-Cryst. Solids , vol.137-138 , pp. 775
- Blayo, N.¹ Drevillon, B.²

34
- 0028463914
- (1994) J. Phys. D , vol.27 , pp. 1406
- Sansonnens, L.¹ Howling, A.A.² Hollenstein, Ch.³ Dorier, J.L.⁴ Kroll, U.⁵

35
- 0003089749
- (1989) Mater. Res. Soc. Symp. Proc. , vol.149 , pp. 33
- i Cabarrocas, P.R.¹

36
- 0001281231
- (1996) J. Appl. Phys. , vol.80 , pp. 5389
- Das, U.K.¹ Chaudhuri, P.² Kshirsagar, S.T.³

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