High-brightness unstable-resonator lasers fabricated with improved dry-etching technology for ultra-smooth laser facets

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4279-4282

  Deichsel, Eckard ^a   Jäger, Roland ^a   Unger, Peter ^a  

^a UNIVERSITY OF ULM   (Germany)

Author keywords

Brightness; Corrected far field; Curved mirror; Dry etch; Facet; Laser; Unstable resonator; Virtual source

Indexed keywords

CONTINUOUS WAVE LASERS; DRY ETCHING; EPITAXIAL GROWTH; ION BEAMS; LASER BEAM EFFECTS; MIRRORS; MULTILAYERS;

CHEMICALLY ASSISTED ION-BEAM ETCHING (CAIBE);

SEMICONDUCTOR LASERS;

EID: 0036614437     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4279     Document Type: Article

References (9)