Easy release of mold in imprint lithography using ion-beam-irradiated photoresist surface

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4190-4193

  Baba, Akiyoshi ^a   Iwamoto, Masakazu ^a   Tsubaki, Kouichi ^a   Asano, Tanemasa ^a  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Easy release of mold; Ion beam irradiation; Nano structure; Nano imprinting; Step and repeat imprinting

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEFORMATION; ION BEAMS; IRRADIATION; MOLDS; NANOTECHNOLOGY; RESINS; STIFFNESS; SURFACE PROPERTIES; SURFACE TREATMENT;

IMPRINT LITHOGRAPHY;

PHOTORESISTS;

EID: 0036614390     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4190     Document Type: Article

References (9)