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Volumn 193, Issue 1-4, 2002, Pages 294-298

Molecular dynamics simulation of ion-beam-amorphization of Si, Ge and GaAs

Author keywords

Amorphization; Defects; Irradiation; Semiconductors

Indexed keywords

CHEMICAL BONDS; COMPUTER SIMULATION; CRYSTALLIZATION; DEFECTS; GERMANIUM; ION BEAMS; IRRADIATION; MOLECULAR DYNAMICS; SEMICONDUCTING GALLIUM ARSENIDE; SILICON;

EID: 0036609668     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)00794-2     Document Type: Conference Paper
Times cited : (25)

References (35)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.