Negative-working photoresist of methacrylate polymers based on the transesterification of the 2-hydroxyethyl group in the presence of an acid

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 40, Issue 11, 2002, Pages 1858-1867

  Lee, Jongsoo ^a   Aoai, Toshiaki ^a   Kondo, SyuN'Ichi ^a   Miyagawa, Nobukazu ^a   Takahara, Shigeru ^a   Yamaoka, Tsuguo ^a,b  

^a CHIBA UNIVERSITY   (Japan)

^b FUJIFILM CORPORATION   (Japan)

Author keywords

2 hydroxyethyl methacrylate; High transparency; Negative working resists; Photoresists; Transesterification

Indexed keywords

CROSSLINKING; ESTERIFICATION; INFRARED SPECTROSCOPY; PHOTOSENSITIVITY; POLYACRYLATES; TERPOLYMERS; ULTRAVIOLET RADIATION;

NEGATIVE WORKING PHOTORESISTS; PHOTOACID GENERATORS; TRANSESTERIFICATION;

PHOTORESISTS;

POLYMER;

EID: 0036604426     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/pola.10252     Document Type: Article

References (24)