Polymerization of N-(tert-butyldimethylsilyloxy)maleimide and applications of the polymers as resist materials

Journal of Applied Polymer Science

Volumn 66, Issue 13, 1997, Pages 2507-2516

  Kim, Sang Tae ^a   Kim, Jin Baek ^a   Chung, Chan Moon ^a   Ahn, Kwang Duk ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; COPOLYMERIZATION; COPOLYMERS; DENSITY (OPTICAL); ELECTRON BEAMS; FREE RADICAL POLYMERIZATION; GLASS TRANSITION; PHOTORESISTS; PLASTIC FILMS; POLYSTYRENES; SOLUBILITY; THERMODYNAMIC STABILITY;

PLASMA ETCH RESISTANCE;

POLYIMIDES;

EID: 0031351749     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-4628(19971226)66:13<2507::AID-APP13>3.0.CO;2-U     Document Type: Article

References (20)