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Volumn 17, Issue 6, 2002, Pages 1371-1375

Effects of postdeposition in situ heat treatment on the properties of low dielectric constant plasma polymer films deposited using decahydronaphthalene and tetraethyl orthosilicate as the precursors

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CORRELATION METHODS; CURRENT DENSITY; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TREATMENT; ORGANIC POLYMERS; PERMITTIVITY; PLASMA APPLICATIONS; POLYMERIZATION; THERMAL EFFECTS;

EID: 0036600618     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2002.0204     Document Type: Article
Times cited : (5)

References (15)
  • 12
    • 85037017106 scopus 로고    scopus 로고
    • From tribological coating to low-k dielectrics for ULSI interconnects
    • IBM Research Report, (IBM, Armonk, NY, Feb. 20)
    • (2001)
    • Grill, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.