Low dielectric constant plasma polymerized methyl-cyclohexane thin films deposited by inductively coupled plasma-enhanced chemical vapor deposition

Thin Solid Films

Volumn 384, Issue 1, 2001, Pages 33-36

  Jo, Hyunuk ^a   Quan, Yong Chun ^a   Jung, Donggeun ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

INDUCTIVELY COUPLED PLASMA; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THERMODYNAMIC STABILITY; THIN FILMS;

INDUCTIVELY COUPLED PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

DIELECTRIC FILMS;

EID: 0035282140     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01808-3     Document Type: Article

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