SCOPUS 정보 검색 플랫폼

Volumn 43, Issue 6, 2002, Pages 1291-1297

Formation of protection layer during oxidation of Al-implanted TiN coating

(6) Akhadejdamrong, Thananan a Mitsuo, Atsushi a Iwamoto, Chihiro a Yamamoto, Takahisa a Ikuhara, Yuichi a Aizawa, Tatsuhiko a

a Tokyo MIT Research Institute (Japan)

Author keywords

Activation energy; Aluminum oxide; Ion implantation; Nanocrystalline; Thin film; Titanium nitride

Indexed keywords

ACTIVATION ENERGY; ALUMINA; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; OXIDATION; OXIDATION RESISTANCE; PROTECTIVE COATINGS; REACTION KINETICS; STAINLESS STEEL; SUBSTRATES; THIN FILMS;

CHEMICAL STABILITY;

TITANIUM NITRIDE;

EID: 0036600301 PISSN: 13459678 EISSN: None Source Type: Journal
DOI: 10.2320/matertrans.43.1291 Document Type: Article

Times cited : (9)

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