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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 5 A, 2002, Pages 3069-3075

Stress changes and stability of sputter-deposited Mo/B4C multilayer films for extreme ultraviolet mirrors

(3) Niibe, Masahito a Nii, Hajime a Sugie, Yosohiro a

a UNIVERSITY OF HYOGO (Japan)

Author keywords

Grain; Internal stress roughness; Mo B4C; Multilayer; Soft X rays; Sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; GRAIN SIZE AND SHAPE; LITHOGRAPHY; MAGNETRON SPUTTERING; MIRRORS; MULTILAYERS; PLASMA DEVICES; RESIDUAL STRESSES; SPUTTER DEPOSITION; STRESS ANALYSIS; SURFACE ROUGHNESS; ULTRAVIOLET INSTRUMENTS; X RAY DIFFRACTION ANALYSIS;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

THIN FILMS;

EID: 0036578058 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.3069 Document Type: Article

Times cited : (15)

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