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Semiconductor Science and Technology
Volumn 17, Issue 5, 2002, Pages 471-475
Effective mobility and alloy scattering in the strain compensated SiGeC inversion layer
(5)
Kar, G S
a
Maikap, S
a
Ray, S K
a
Banerjee, S K
b
Chakrabarti, N B
a
a
INDIAN INSTITUTE OF TECHNOLOGY
(
India
)
b
The University of Texas at Austin
(
United States
)
Author keywords
[No Author keywords available]
Indexed keywords
HETEROJUNCTIONS; HOLE MOBILITY; SCATTERING; SEMICONDUCTING SILICON COMPOUNDS; SILICON ALLOYS; STRAIN;
ALLOY SCATTERING;
MOSFET DEVICES;
EID
:
0036566756
PISSN
:
02681242
EISSN
:
None
Source Type
:
Journal
DOI
:
10.1088/0268-1242/17/5/311
Document Type
:
Article
Times cited : (
6
)
References (
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)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.