Early stages of interface reactions between AIN and Ti thin films

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 3, 2002, Pages 887-896

  Pinkas, M ^a   Frage, N ^a   Froumin, N ^a   Pelleg, J ^a   Dariel, M P ^a  

^a BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM NITRIDE; AUGER ELECTRON SPECTROSCOPY; COMPOSITION; DEPOSITION; HEAT TREATMENT; HIGH RESOLUTION ELECTRON MICROSCOPY; INTERFACES (MATERIALS); MOLYBDENUM; SUBSTRATES; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CROSS SECTION TRANSMISSION ELECTRON MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

THIN FILMS;

EID: 0036564810     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1472417     Document Type: Article

References (31)