Interfacial reactions between AlN substrate and 4-A family elements

Materials Research Society Symposium - Proceedings

Volumn 398, Issue , 1996, Pages 269-273

  Du, Yong ^a   He, Xiangjun ^a   Tao, Kun ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; ANNEALING; INTERFACES (MATERIALS); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; TITANIUM; TITANIUM COMPOUNDS; VAPOR DEPOSITION; X RAY DIFFRACTION;

ALUMINUM NITRIDE; INTERFACIAL REACTIONS; PHYSICAL VAPOUR DEPOSITION;

REACTION KINETICS;

EID: 0029767513     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)