Moving mask deep X-ray lithography system with multi stage for 3-D microfabrication

Microsystem Technologies

Volumn 8, Issue 2-3, 2002, Pages 93-98

  Tabata, O ^a   You, H ^a   Matsuzuka, N ^a   Yamaji, T ^a   Uemura, S ^a   Dama, I ^a  

^a RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; FABRICATION; MICROOPTICS; MICROSTRUCTURE; PRISMS; SCANNING; X RAY LITHOGRAPHY;

MICROFABRICATION;

MICROELECTROMECHANICAL DEVICES;

EID: 0036564241     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-001-0168-0     Document Type: Conference Paper

References (6)

1. An X-ray lithographic exposure tool for nonplanar objects
2. 3-D micromachining with TIEGA process
3. 2LIGA) process for control of side wall inclination
4. 3-dimensional microstructure fabrication using multiple moving mask deep X-Ray lithography
5. 2DXL)
6. Deep X-ray exposure system with multistage for 3-D microfabrication